lift off光刻胶LOR/PGMI
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Lift off光刻胶 | 光刻胶型号 | 适用光谱 | 厚度范围/um | 分辨率 | 适用工艺 |
RN 218系列 | g/h/i-Line | 4-12um | 2um | lift off 厚膜负性光刻胶 | |
RN 246系列 | g/h/i-Line | 4-12um | 2um | lift off 负性光刻胶 | |
ma-N 400系列/1400系列 | g/h/i-Line | 4-12um | 0.5um | 负性光刻胶,可用于传统光刻和lift off工艺,适用于高温工艺 | |
AZ nLOF 2000系列 | i-line | 2-11um | 0.5um | lift off 负性光刻胶,耐特高温;可用于RIE工艺 | |
LOR/PGMI | g/h/i-Line | 0.35-7 | 0.5um | 双层胶工艺 | |
LOL2000 | g/h/i-Line | 130nm-300nm | 0.5um | 双层胶工艺 |
热门标签:LOR/PGMI