Number of barriers:

One

Full free surface area:

855 cm2

Maximum free surface area confined with the barrier:

815 cm2

Compressed (effective) area:

620 cm2

Liquid medium volume:

9600-10900 cm3

Dipping well:

not smaller than 250x180x200 mm (w-d-h)

Maximum dimensions of the immersed substrate:

170x170x170 mm (w-d-h)

Travel range of the movable horizontal barrier:

350 mm

Velocity range of the barrier motion:

- single side compression 0.01 to 50 mm/min

Dipper mechanism stroke:

86 mm (vertical position of the unit can be adjusted   manually)

Dipper mechanism velocity range:

0.0140 mm/min,

Step of the dipper mechanism velocity change:

0.1 mm/min

Possibility of altering different monomolecular   layers deposition:

Available

Delay between the layers deposition:

0100000 s

Surface tension sensor:

based on Wilhelmy plate 15x15 mm (vertical position   of the sensor can be adjusted manually)

Working range of the surface tension sensor:

0-80 mN/m (stepped ａnd fine adjustment of the range   are available)

Sensitivity of the surface tension sensor:

0.05 mN/m

Number of surface tension sensors:

One / Two (two sensors my be used by default)

Doser for substance feed to   aqueous surface:

- syringe pump: with substance reserve 1 ml   (syringes of up to 10 ml applicable), motion range of leading rod 65 mm
  - peristaltic pump with flow rate about 0.157 ml per one revolution of motor

Overall dimensions:

Trough without mounted rig not bigger than   490x280x260 mm (w-d-h); 
  Maximum size with installed accessories 660x340x500 mm (w-d-h);
  Control unit 200x293x80 mm (w-d-h); 
  Total weight (with all accessories ａnd control unit) 21 kg

Supply voltage:

240 V / 2.3 A / 50 Hz

Control voltage supplied from control unit to   elements of the trough:

+5 V; -5 V; +15 V

Power consumption:

Average 100 W, peak not more than 500 W (without   host PC)

Additional accessories:

• Substrate clamping        holder for fixing a flat sample on the dipper lever.

• Rig for film        application by the horizontal precipitation method (by liquid medium        draining)*.

• A mountable unit for        tape substrate winding with set of guides.

• A syringe pump doser or        peristaltic pump to feed substance film on liquid interface.

• Rotating barrier for        substance film transfer into the deposition zone.

• One draining nozzle at        bottom of the dipping well ａnd 3 additional nozzles in shallow area, all        nozzles for connecting tube of 5 mm inner diameter.

 Deposition of X-type LB film

 Deposition of Y-type LB film

 Deposition of Z-type LB film

  Horizontal   precipitation (HP) method (by liquid medium draining) provides surface   modification by extremely uniform ａnd homogenous monolayer films (see, for   examplethis paper). HP method allows transferring of monolayer films at various surfaces   simultaneously from huge variety of surfactants (both in solid ａnd liquid   state) despite of polar head structure. The process of deposition is simple   ａnd fast. In particular, the surface of metallized silicon wafer can be   modified by HP method within 3-5 minutes.

  Roll-To-Roll deposition technique engages   additional accessories in the set of LB trough LT-310 to deposit   monomolecular film on tape (continuous deposition on flexible substrate). In   LT-310, extraction angle of the exiting portion of tape may be adjusted in   range 30-90owith step 5o