OAI Model 212型紫外光刻机

。输出光谱范围:Hg: G(436nm),H(405nm),I(365nm)和310nm,Hg-Xe: 260 nm和220 nm或LED:365 nm、395 nm和405 nm

。灯功率范围从1000到5000 w

。选择UVLED (365 nm和405 nm)光源

。基片尺寸范围从12“dia平方

。特殊12“x 12”和3毫米厚玻璃基板

。互换抛掷和面具

。空气轴承真空吸盘

。接近(15-20umgap): & lt; 3.0 - 5.0,柔软触点:2.0um，硬触点:1um和真空接点:≤0.5um

。对齐模块X, Y,和Z轴和θ

。双通道光学反馈

。只提供正面接触w / IR选项

。仅在桌面选项可用,适用于研发和独立的工作

。占用空间小

。适用于生物学、微机电系统、半导体和Microfludics CLiPP应用程序

Model 212 Table Top Mask Aligner System

。 Output Spectra Range: Hg: G (436nm), H (405nm), I(365nm) ａnd 310nm lines, Hg-Xe: 260nm ａnd 220nm or LED: 365nm, 395nm ａnd 405nm
。 Lamp Power range from 1000 to 5000W
。 Option for UVLED (365nm ａnd 405nm) Light Source
。 Substrate sizes range from 12” dia to sq
。 Special 12” x 12” ａnd up to 3mm thick Glass Substrates
。 Interchangeable chucks ａnd mask holders
。 Air bearing vacuum chuck
。Proximity (15-20umgap ): <3.0 – 5.0um, Soft Contact: <2.0um, Hard contact: 1um and vacuum contact : ≤ 0.5um
。 Alignment module X, Y, ａnd Z axis ａnd theta
。 Dual-channel optical feedback
。 Provides Front side exposure only w/ IR Option
。 Available in Table option only ａnd applicable for R&D ａnd standalone work
。 Small Footprint
。 Applicable for Biology, MEMS, Semiconductor ａnd Microfludics, CLiPP applications