Pioneer Two 电子束光刻机：

1.       系统适用于2"及以下的样片，采用热场发射电子枪，加速电压为20V~30kV。可实现高分辨电子束曝光，*小验收线宽≤8nm。
2.       系统中集成了高精度的激光干涉工作台，运动行程为50 x 50 x 25mm，XY方向定位精度为2nm，可以实现精确的拼接套刻，拼接套刻精度≤50nm。
3.       系统兼具了高精度成像度量的功能，其成像效果和市面上中高端的热场电镜类似，放大倍数为20x ~1,000,000x。 
4.       另外，除了标准配置, 客户还可以增加一些选配件，如选配背散射探测器、能谱仪等，进行材料分析；选配工作台旋转倾斜模块，实现不同角度的材料成像等。如果选择相应的选配件，请增加相应的价格。

1. The system is suitable for the sample of 2" ａnd below, using the thermal-field emission gun, ａnd the acceleration voltage is 20V~30kV.High resolution electron beam exposure can be realized, ａnd the minimum acceptance line width is 8nm.

2. The system integrates a high-precision laser interference workbench with a motion stroke of 50 x 50 x 25mm ａnd a positioning accuracy of 2nm in XY direction, which can realize precise Mosaic nesting with a precision of 50nm.

3. The system has the function of high-precision imaging measurement, ａnd its imaging effect is similar to the high-end thermal field electron microscope on the market, with the magnification of 20x ~1,000,000x. 

4. In addition to standard configuration, customers can also add some optional accessories, such as backscatter detector ａnd energy spectrometer, for material analysis;Optional table rotation tilt module, to achieve different angles of material imaging.If you choose the appropriate accessories, please increase the corresponding price.