紧凑型开放式样品载入原子层沉积（ALD）系统

OpAL提供了业的热ALD设备，可以简单明了的升使用等离子体，使得在同一紧凑设备中集成了等离子体和热ALD。

· 开放式样品载入热ALD，集成等离子体技术

· 现场升到可使用等离子体

· 从小晶片到200mm大晶片

适用于学术、产业、研发的热和/或等离子体化学产品，可用于：

氧化物： HfO2, Al2O3, TiO2, SiO2, ZnO, Ta2O5
氮化物：TiN, Si3N4
金属： Ru, Pt

ALD应用举例：

· 纳米电子学

· 高k栅氧化物

· 存储电容器绝缘层-铜连线间的高纵横比扩散势垒区

· 有机发光二管和聚合物的无针孔钝化层

· 钝化晶体硅太阳能电池

· 应用于微流体和MEMS的高保形涂层

· 纳米孔结构的涂层

· 生物微机电系统

· 燃料电池

直观性强的的软件提高性能

使用与牛津仪器的值得信赖的Plasmalab ®产品家族相同的软件平台， OpAL的程序驱动、多用户别、PC2000TM控制的软件易于操作且可为快速ALD做相应修改。

OpAL provides professional thermal ALD equipment that can be easily upgraded using plasma so that plasma ａnd thermal ALD are integrated in the same compact device.

· open sample loading ALD, integrated plasma technology

· upgrade the site to use plasma

· small to 200mm chips

Thermal and/or plasma chemical products suitable for academic, industrial, research ａnd development use:

Oxides: HfO2, Al2O3, TiO2, SiO2, ZnO, Ta2O5

Nitride: TiN, Si3N4

Metal: Ru, Pt

ALD application examples:

· nano electronics

· high k gate oxides

· high aspect ratio diffusion barrier area between storage capacitor insulation layer ａnd copper wire

· pinhole-free passivation layer for organic light-emitting diodes ａnd polymers

· passivated crystalline silicon solar cells

· high conformal coatings for microfluidics ａnd MEMS applications

· coating of nanopore structure

· biological micro-electromechanical system

· fuel cell

Intuitive software improves performance

Using the same software platform as Oxford instruments＇ trust-worthy Plasmalab ® family of products, OpAL＇s program-driven, multi-user level, PC2000TM controlled software is easy to operate ａnd can be modified for fast ALD.