美Nano-master兆声晶圆清洗机SWC-4000

产品特点：

SWC-4000兆声晶圆清洗机：Nano-Master兆声单晶圆及掩模版清洗机提供高可重复性、高均匀性及Z的兆声清洗。它可以在一个工艺步骤中包含了利的无损兆声清洗、化学试剂清洗、刷子清洗以及干燥功能。

SWC-4000兆声晶圆清洗机应用：

。带图案或不带图案的掩模版和晶圆片
。Ge, GaAs以及InP晶圆片清洗
。CMP处理后的晶圆片清洗
。晶圆框架上的切粒芯片清洗
。等离子刻蚀或光刻胶剥离后的清洗
。带保护膜的分划版清洗
。掩模版空白部位或接触部位清洗
。X射线及紫外掩模版清洗
。光学镜头清洗
。ITO涂覆的显示面板清洗
。兆声辅助的剥离工艺

特点：

。支持12"直径的圆片或9"x9"方片
。独立系统
。无损兆声,试剂，毛刷清洗及旋转甩干
。微处理机自动控制
。化学试剂滴胶单元
。溶剂与酸分离排废
。热氮
。30"D x 26"W 的占地面积

Product features:

SWC-4000 mega sound wafer cleaner: nano-master mega sound single wafer ａnd mask cleaner provides high repeatability, high uniformity ａnd Z advanced mega sound cleaning.It can include patented non-destructive sound cleaning, chemical cleaning, brush cleaning, ａnd drying functions in a process step.

Swc-4000 sound wafer cleaning machine application:

.Patterned or unpatterned masks ａnd wafers

.Ge, GaAs ａnd InP wafer cleaning

.Clean the wafer after CMP treatment

.Clean the chip on the wafer frame

.Cleaning after plasma etching or photoresist stripping

.Separate plate cleaning with protective film

.Mask blank area or contact area cleaning

.X - ray ａnd extreme ultraviolet mask cleaning

.Optical lens cleaning

.Clean ITO coated display panel

.Sound assisted stripping process

Features:

.Supports 12" diameter wafers or 9"x9" squares

.Independent system

.Non - destructive sound, reagent, brush cleaning ａnd spinning dry

.Microprocessor automatic control

.Chemical agent droplet unit

.Solvent ａnd acid are separated ａnd discharged

.Hot nitrogen

.30"D x 26"W floor space