Advance Riko ultra-high temperature high speed annealing furnace, Japan:

.Desktop: ht-rta59hd

.With water quenching: CAS-59AQ

Product description:

Ht-rta59hd this tabletop ultra-high temperature high speed annealing furnace with high power point focused heating ａnd ultra-high reflection efficiency can heat 15mm×15mm samples to 1800℃ in 10s ａnd annealing SiC ａnd other high melting point materials.

Application:

• generation ａnd activation of SiC oxide film;

• semiconductor development ａnd research;

• heat treatment of glass substrates, ceramics, composites, etc.;

• heat treatment of high melting point materials as a heat treatment furnace;

• thermal shock testing of ceramic materials. 

Features:

.Can be heated to ultra-high temperature 1800℃ within 10s;

.Can be directly quenched after heating;

.Infrared lamp heating provides clean heating to reduce the generation of dust ａnd gas;

.Compact desktop design;

.Connect with the computer via USB ａnd input the temperature parameters;

.During the heating process, the temperature is displayed on the computer screen.