The NicoletTM ECOTM/RS FT-IR Semiconductor Wafer Profiling System is ideally suited for research and development in semiconductor wafer manufacturing. The ECO/RS 300 is commonly used for measuring dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional Carbon and interstitial oxygen levels in silicon wafers. The ECO/RS 300 can be used with wafers ranging from slugs and pieces to 300 mm in diameter. |