AsH3Ar5ppm-5%H25ppm-5%
He5ppm-5%N25ppm-5%
B2H6Ar5ppm-5%H25ppm-5%
He5ppm-5%N25ppm-5%
(CH3)2ZnAr25ppm-2000ppmH225ppm-2000ppm
He25ppm-2000ppmN225ppm-2000ppm
Kr/F2NeF2:0.1-1%; Kr:1.3-3.36%;
NeKr:1.3%
HeF2:0.2%; Kr:2.,5%
PH3Ar5ppm-15%N25ppm-15%
He5ppm-15%Silane5%-30%
H25ppm-15%
PlasmaEtching混合气CF4O2:4%; 8%; 10%
HeO2:1.76%; CF4:18.94%
O2CF4:8%
SiH4Ar5ppm-15%H25ppm-15%
He5ppm-15%N25ppm-15%