FT-IR Metrology Tool

赛默飞世尔科技(原热电公司）

Nicolet ECO 2000 FT-IR度量工具

Nicolet ECO 2000 FT-IR Metrology Tool

	Designed for 200 mm SMIF carriers or manual loading of 100 mm to 200 mm wafers, the Nicolet^TM ECO^TM 2000 measures dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional carbon and interstitial oxygen levels in silicon wafers.

Product Detail

	Some of the highlights of the ECO 2000 include: Completely automated wafer handling Automated wafer centering and alignment using flats or notches High throughput Exceptionally stable and reproducible measurement results Wafer contact using Teflon-coated vacuum holds on the backside only Capable of measuring epitaxial film thickness from 300 nm to 7,500 nm Powerful FT-IR software toolkit for custom recipe generation SECS/GEM communications software Compliant with SEMI S2 and S8 safety and ergonomic standards Flexible measurement options from single point measurements to complete wafer mapping options Transmission and reflectance measurement capability to accommodate the widest range of materials and films Support of both ASTM and JEIDA standards Class 2 cleanroom ready The ECO 2000 maintains the proven low cost of ownership and high reliability of our long-running series of ECO tools. Founded on our base of expertise in FT-IR technology, the ECO 2000 is also at the top of its class in performance. Thermo is committed to offering the most expertise and the best possible tools for FT-IR metrology. The ECO 2000 is another affirmation of this commitment.

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