电子工业用高纯气体（4）

名称平衡气杂质含量
N2O99.9997%ScottGas:SEMI C3.13-93: N2〈2ppm; O2〈0.4ppm; THC〈0.1ppm; CO2〈0.5ppm; H2O〈1ppm; CO〈0.1ppm; NH3〈1ppm; NO〈0.5ppm; NO2〈0.5ppm; 卤素〈0.5ppm
99.999%ScottGas:SEMI C3.13-93: N2〈5ppm; O2〈2ppm; THC〈1ppm; CO2〈2ppm; H2O〈3ppm; CO〈1ppm; NH3〈5ppm; NO〈0.5ppm; NO2〈0.5ppm; 卤素〈0.5ppm
99.997%CH4〈1.0; CO〈1.0; CO2〈2.0; N2〈10.0 NO〈0.5; NH3〈2.0; O2+Ar〈2.0
99.98%CO〈5; CO2〈100; H2O〈2.0; NO〈0.5; NO2〈0.5
PH399.9997%Ar〈0.5; C3H8〈0.1; N2〈1.0; AsH3〈0.1; CO〈0.1; O2〈0.1;CH4〈0.1; CO2〈0.1; C2H6〈0.1; H2O〈1.0
PF399.0%
SiH499.9999%ScottGas:N2〈1ppm; O2〈0.05ppm; THC〈0.15ppm; CO2〈0.1pm; CO〈0.05ppm; H2O〈0.5ppm; Ar〈0.05; Chlorosilines〈0.1ppm; He〈1ppm; H2〈20ppm; 乙硅烷〈0.15ppm; 硅氧烷〈0.1; 电阻 ohm/cm〉10,000
99.9996%Ar〈0.5; 总氯〈0.1; Fe〈1.5ppb； CH4〈0.05; 总氟〈0.1; Ga〈0.04ppb;CO〈0.05; 甲基硅烷〈0.1; In〈0.04ppb; CO2〈0.1; 乙基硅烷〈0.1; Ni〈0.5ppb; He〈10; Al〈0.03ppb; p〈0.15ppb; H2〈75; As〈0.01ppb; Sb〈0.01ppb; H2O〈0.5; B〈0.1ppb； N2〈1.0; C〈0.2; O2〈0.3; Cr〈0.5ppbTHC〈0.15
99.99%CO〈2.0; He〈10.0; O2+Ar〈5.0; CO2〈2.0; H2O〈1.0; 总氯〈10.0; H2〈80.0; N2〈10.0; THC〈1.0;
99.97CO〈10; H2O〈5; 总氟〈200; CO2〈10; O2+Ar〈10;;H2〈4000; THC〈40
SiCl4〉99.99%HCl〈35; Al〈10ppb; Mo〈7ppb; Si-HCl3〈5; CO〈1ppb; Ni〈2ppb;SiH2Cl2〈2; Cr〈1ppb; Ti〈1ppb; SiH3Cl〈2; Cu〈1ppb; V〈2ppb;Si-OH,5; Fe〈10ppb; Zn〈3ppb; Si-OH(THC)〈5; Mn〈1ppb;
SiF499.998%ScottGas:N2〈3ppm; Ar+O2〈1ppm; THC〈10ppm; CO2〈1pm; 砷硼磷〈0.5ppm
99.99%CO2〈1; HF〈50; Ar〈0.5; CO〈0.5; O2〈1; P〈0.5; CH4〈10; N2〈3; B〈1.0
SF699.999%ScottGas:N2〈5ppm; O2〈3ppm; THC〈1ppm; Halocarbon 14〈5ppm; 水〈3ppm; 氟化氢〈0.1ppm
99.99%
WF699.9995%