电子工业用高纯气体（２）

气体种类规格杂质含量(ppm)
BF399.99%N2〈15; SO2〈50; SiF4〈20; O2〈5; S〈8
B11同位素99.9%ScottGas: 同位素纯度99.7％. N2〈25ppm; O2〈25;SO2〈25ppm; Ar〈25ppm; CO2〈25ppm; HF〈25ppm
99%Air〈1%; SO4〈10; SO2〈20; SiF4〈200
B11F399.5%Air〈0.5; B10〈0.5%
CO299.999%ScottGas: H2〈5ppm; N2〈4ppm; O2〈1ppm; CO〈0.5ppm; H2O〈1ppm; THC〈0.5ppm
99.995%ScottGas: Ar〈5ppm; H2〈5ppm; N2〈20ppm; O2〈2ppm; CO〈5ppm; CH4〈2ppm; H2O〈3ppm; 不挥发有机物〈0.1ppm(w/w)
CO99.99%ScottGas: H2O〈5ppm; O2〈5ppm; N2〈10ppm; H2〈2ppm; CO〈15ppm; THC〈2ppm
B2H699.998%ScottGas: CO2〈5ppm; THC〈5ppm; N2〈10ppm; O2〈1ppm
Cl299.999%
99.998%CH4〈1.0; H2〈1.0; N2〈4.0; CO2〈8.0; H2O〈2.0; O2〈4.0
SiH2Cl299.0%Al〈1; B〈0.3; Fe〈25； As〈0.5; C〈5; P〈0.3
Si2H699.998%ScottGas: Ar+O2+N2〈3ppm; THC〈1ppm; CO2〈1ppm; H2O〈1ppm; 硅氧烷〈5ppm; 氯硅烷〈0.2ppm; 电阻 ohm/cm〉1,000
99.8%THC〈10; H2〈1.0;有机Si〈50； CO〈1.0; O2+Ar〈1.0; 三硅化物〈1000; CO2〈1.0; SiF4〈1000; H2〈100; 总氯〈3.0
GeH499.999%ScottGas: N2〈2ppm; O2〈0.5ppm; THC〈1ppm; CO2〈2ppm; CO+Trigemane〈1ppm; H2O〈1ppm; Gemoxanes〈5ppm; Chlorogermanes〈5ppm
CCl3F99.9%CClF399.9%
CCl2F299.9%CBrF399.0%
H2Se99.998%ScottGas:n2〈4ppm; O2〈1ppm;co2〈10ppm;THC〈0.5ppm;H2O〈10ppm
CF499.999%
99.997%CO〈1.0; N2〈20; SF6〈1.0; CO2〈1.0; O2+Ar〈5.0; 总氟化物〈0.1; H2O〈0.5; 卤代烃〈2.0
CHF399.996%ScottGas: N2〈15ppm; O2〈5ppm; Acidity〈0.1ppmw; CO2〈10ppm; H2O〈5ppm
99.99%ScottGas: N2〈50ppm; O2〈10ppm; Acidity〈0.1ppmw; CO2〈10ppm; H2O〈5ppm
99.95%Air〈100; H2O〈10; HCl〈0.1
CHClF299.9%CHCl2CF399.0%CHClF-CF399.0%
CHF2-CF399.0%CH2FCH399.0%C2H3ClF298.0%
CH2F299.99%ScottGas: N2〈40ppm; O2〈10ppm; H2O〈10ppm; 酸性物〈0.1ppmw;
CH3F99.99%ScottGas: N2〈80ppm; O2〈20ppm; H2O〈10ppm;
99.9%ScottGas: N2〈400ppm; O2〈100ppm; H2O〈20ppm;
C2ClF599.5%